Forged Zirconium Sputtering Target Zr702 Sputter Target
|Place of Origin:||China|
|Model Number:||Aluminum Plate Sputtering Target|
Payment & Shipping Terms:
|Minimum Order Quantity:||1kg|
|Packaging Details:||Plywood case|
|Delivery Time:||10～25 work days|
|Payment Terms:||L/C, D/A, D/P, T/T, Western Union|
|Material:||Aluminum Plate Sputtering Target||Process:||CIP, HIP Pressing|
|Size:||Customized||Application:||PVD Coating System|
|Shape:||Round , Plate, Tube||Grain Size:||Fine Grain Size, Good Density|
|Purity::||99.95%, 99.99%, 99.999%||Density:||2.7g/cm3|
metal sputtering targets,
tungsten sputtering target
High purity aluminum ingots (99.995%) were used as raw materials to prepare large-scale high-purity aluminum plates with good surface and shape by hot rolling. The microstructure of high-purity aluminum plates annealed at different temperatures was studied. The results show that after annealing at 280 ℃ for 45 min and 55 min respectively, the as rolled aluminum sheet with 95% deformation can obtain the equiaxed structure with good grain size, and its average grain diameter is 62.4 μ m and 128.4 μ m respectively. The rolling deformation of the last pass has a decisive influence on the grain size of the product. The larger the deformation is, the smaller the grain is
Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...
Aluminum Plate Sputtering Target 99.999% , Aluminum Planar Sputtering Target 99.999%
are available in varying sizes
High purity aluminum target is widely used in semiconductor device manufacturing industry. The preparation of target requires not only the purity of high purity aluminum, but also the fine and uniform grain structure, as well as a high proportion of (001) orientation. The evolution of microstructure and texture of high-purity aluminum under different rolling and annealing processes, and the effect of recrystallization behavior on the microstructure of high-purity aluminum target
In the field of superconductivity, ultra-high purity aluminum is used as the stabilizing material of superconducting cable.
In the field of electronics, 5N ultrapure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro disk, DVD silver disk, etc., in which 5N ultrapure aluminum sputtering film is used as the light reflecting layer.
|Grades:||Aluminum Sputtering target|
|Purity: 99.99%, 99.9999%|
|Aluminum||High purity Aluminum Sputtreing target|
|Shape:||Round Shape , Tube Shape and Plate Shape.|
Plate sputtering targets:
Thickness: 0.04 to 1.40" (1.0 to 35mm).
Width up to 20"(50 to 500mm).
Length: 3.9" to 6.56 feet( 100-2000mm)
other sizes as requested.
Cylinder sputtering targets:
3.94 Dia. x 1.58"(100 Dia. x 40mm)
2.56 Dia. x 1.58" (65 Dia. x 40mm)
or 63*32mm other sizes as requested.
Tube sputtering targets:
2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)
3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)
other sizes as requested.