JINXING Chromium Sputtering Target , High Purity Chromium Evaporation Materials

Product Details:
Place of Origin: China
Brand Name: JINXING
Certification: ISO 9001
Model Number: Chromium Evaporation Material
Payment & Shipping Terms:
Minimum Order Quantity: 1kg
Price: 20~150USD/kg
Packaging Details: Plywood case
Delivery Time: 10~25 work days
Payment Terms: L/C, D/A, D/P, T/T, Western Union
Supply Ability: 100000kgs/M

Detail Information

Material: Chromium, Chrome Shape: Sheet Or Cylinder , Granular
Process: CIP, HIP Pressing Application: Evaporation Material,Evaporation Coating
Density: 7.19g/cm3 Grain Size: Fine Grain Size, Good Density
Purity: 99.5%, 99.9%, 99.95% Size: Customized
High Light:

titanium sputter target

,

tungsten sputtering target

Product Description

Chromium Evaporation Material 99.5%, 99.9%, 99.95%

Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere to make it evaporate. The evaporated particles flow directly to the substrate and deposit on the substrate to form solid film.

Vacuum evaporation coating is an earlier technology and widely used. From the condition of coated particles, evaporation coating is not as good as sputtering and ion plating, but vacuum evaporation technology still has many advantages, such as relatively simple equipment and process, deposition of very pure film, preparation of film with specific structure and properties, etc. It is still a very important coating technology today. In fact, evaporation plating technology has formed an expanding industry, which is widely used in various industries and occupies an important position.

 

There are many kinds of evaporation coating materials. At present, there are hundreds of them are mainly used in the market. The production process mainly includes: Crystal crushing, melting crushing, wire drawing, wire cutting, granulation, pulverizing, tablet pressing, casting, molding, etc. The product shape mainly includes: wire rod, powder, irregular particle, small cylinder, small ball, cone

 

Chromium evaporation material, Chromium coating material are available in varying sizes 

 

Generally, the evaporation material heats the target to evaporate the surface components in the form of atomic groups or ions, and settles on the substrate surface, forming the film through the film forming process (scattered island structure stray structure layer growth).

 

 

Grades: Chrome Sputtering target
  Purity: 99.5%, 99.9%, 99.95%
Size 3x3mm, 6x6mm
Density:  7.19g/cm3
Shape: sheets, granular 

 

 

 

The main products are :

 as follows: (particles, blocks and powders can be customized) aluminum particles 99.99% 3 * 3mm; 99.999% 3 * 3mm copper particles 99.99% 3 * 3mm; 99.999% 3 * 3mm iron particles 99.9% 2 * 3mm titanium particles 99.999% 6 * 6mm vanadium particles 99.9% 3 * 3mm nickel particles 99.999% 6 * 6mm chromium particles 99.95% 3-5mm cobalt particles 99.95% 2-8mm manganese particles 99.8% 1-10 mm barium particles 99.6% 2-6cm (as deoxidizer) Calcium particles 99.5% 1-3mm (used as deoxidizer) tungsten particles 99.95% 6 * 6mm niobium particles 99.95% 6 * 6mm molybdenum particles 99.95% 6 * 6mm tantalum particles 99.95% 6 * 6mm zirconium particles 99.5% 1.6 * 5mm; 99.95% 2.4 * 5mm crystal hafnium rods 99.9% d21mm hafnium particles 99.9%.

 

High purity aluminum Al, high purity copper Cu, high purity titanium Ti, high purity silicon Si, high purity gold Au, high purity silver AG, high purity indium in, high purity magnesium mg, high purity zinc Zn, high purity platinum Pt, high purity germanium Ge, high purity nickel Ni, High purity tantalum TA, gold germanium alloy Auge, gold nickel alloy auni, nickel chromium alloy NiCr, titanium aluminum alloy TiAl, copper indium gallium alloy cuinga, copper indium gallium selenium alloy CuInGaSe, zinc aluminum alloy ZnAl, aluminum silicon alloy AlSi and other metal coating materials.

 

Type Application Main alloy Request
Semiconductor Preparation of core materials for integrated circuits W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

 

 

 

Highest technical requirements, ultra-high purity metal, high precision size, high integration

 

Screen Display Sputtering technology ensures uniformity of film production, improves productivity and reduces cost Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

 

 

 

High technical requirements, high-purity materials, large material area and high degree of uniformity

 

Decorate It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

 

 

 

 

Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target

 

mainly used for decoration, energy saving, etc
Tooling

 

 

 

Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts

 

TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc High performance requirements and long service life
Solar photovoltaic Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc Wide Application
Electronic accessories

 

 

 

 

For film resistance and film capacitance

 

NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc Small size, good stability and small resistance temperature coefficient are required for electronic devices
Information storage

 

 

 

 

For making magnetic memory

 

Cr based, Co based, CO Fe based, Ni based alloys High storage density, high transmission speed

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