High Purity Aluminum Plate Sputtering Targets For Semiconductor Industry

Product Details:
Place of Origin: China
Brand Name: JINXING
Certification: ISO 9001
Model Number: Aluminum Plate Sputtering Target
Payment & Shipping Terms:
Minimum Order Quantity: 1kg
Price: 10~500USD/kg
Packaging Details: Plywood case
Delivery Time: 10~25 work days
Payment Terms: L/C, D/A, D/P, T/T, Western Union
Supply Ability: 100000kgs/M

Detail Information

Material: Aluminum Plate Sputtering Target Process: CIP, HIP Pressing
Size: Customized Application: PVD Coating System
Shape: Round , Plate, Tube Grain Size: Fine Grain Size, Good Density
Purity:: 99.95%, 99.99%, 99.999% Density: 2.7g/cm3
High Light:

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tungsten sputtering target

Product Description

Aluminum Plate Sputtering Target (Al) High purity 99.999%

High purity aluminum ingots (99.995%) were used as raw materials to prepare large-scale high-purity aluminum plates with good surface and shape by hot rolling. The microstructure of high-purity aluminum plates annealed at different temperatures was studied. The results show that after annealing at 280 ℃ for 45 min and 55 min respectively, the as rolled aluminum sheet with 95% deformation can obtain the equiaxed structure with good grain size, and its average grain diameter is 62.4 μ m and 128.4 μ m respectively. The rolling deformation of the last pass has a decisive influence on the grain size of the product. The larger the deformation is, the smaller the grain is

Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...



Aluminum Plate Sputtering Target 99.999% , Aluminum Planar Sputtering Target 99.999%

are available in varying sizes 



High purity aluminum target is widely used in semiconductor device manufacturing industry. The preparation of target requires not only the purity of high purity aluminum, but also the fine and uniform grain structure, as well as a high proportion of (001) orientation. The evolution of microstructure and texture of high-purity aluminum under different rolling and annealing processes, and the effect of recrystallization behavior on the microstructure of high-purity aluminum target

In the field of superconductivity, ultra-high purity aluminum is used as the stabilizing material of superconducting cable.

In the field of electronics, 5N ultrapure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro disk, DVD silver disk, etc., in which 5N ultrapure aluminum sputtering film is used as the light reflecting layer.




Grades: Aluminum Sputtering target
  Purity: 99.99%, 99.9999%
Aluminum  High purity Aluminum Sputtreing target
Density: 7.19g/cm3
Shape: Round Shape , Tube Shape and Plate Shape.




Plate sputtering targets:


Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.


Cylinder sputtering targets:


3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.


Tube sputtering targets:


2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.


High Purity Aluminum Plate Sputtering Targets For Semiconductor Industry 0

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