Dia 300mm Aluminum Titanium Alloy Target High Die Casting Yield

Product Description

Aluminum Titanium Alloy Target

Aluminum Titanium Alloy Target  is a metal material with high die-casting yield, high density, high strength and good flexibility. The difference between aluminum-titanium alloy and titanium-aluminum alloy lies in the ratio of these two elements. Aluminum-titanium alloy usually contains 0.50 to 1.20% by weight of magnesium, 1.80 to 2.30% by weight of manganese, 0.05 to 0.15% by weight of titanium, and iron and copper in impurities, accounting for less than 1.00% of the total weight of iron, copper and zinc, The rest is aluminum. The aluminum-titanium sputtering target can be made of aluminum-titanium alloy. The aluminum-titanium sputtering target has high feed speed, excellent cutting performance and impressive metal removal rate. The aluminum-titanium coating can protect your tools from wear and tear, thereby extending their service life. Aluminum-titanium sputtering targets can also be used for decorative coatings on electronic devices (such as mobile phones, spectacle frames or the dials of luxury watches).

Aluminum-titanium alloy target material is cost-effective
The aluminum-titanium target combines the advantages of the aluminum target and the titanium target. As we all know, titanium and titanium alloys have excellent properties in various industries, but the problem is that their prices are too high. In aluminum-titanium alloys, the content of titanium is only 0.05% to 0.15%, so its price is cheaper than pure titanium and titanium alloys.

Aluminum Titanium Alloy Target Picture:

Aluminum Titanium Alloy Target is an alloy sputtering target material for vacuum coating, in which the content of titanium and aluminum can be adjusted to obtain titanium aluminum alloy targets with different characteristics.
Titanium-aluminum intermetallic compound is a hard and brittle material with good wear resistance. A layer of titanium-aluminum intermetallic compound is coated on the surface of ordinary tools, which can effectively prolong the use time of the tool. For example, sputtering is carried out with nitrogen discharge arc starting. A surface film with high hardness and low friction coefficient can be obtained, which is particularly suitable for surface coating of various tools, molds and other vulnerable parts, so it has a good application prospect in the machining industry. The preparation of titanium aluminum alloy targets is difficult. According to Titanium-aluminum alloy phase diagram, titanium and aluminum can form a variety of intermetallic compounds, resulting in processing brittleness of titanium-aluminum alloy, especially when the aluminum content of the alloy exceeds 50% (atomic ratio), the oxidation resistance of the alloy is suddenly reduced , The oxidation is serious. At the same time, the exothermic expansion during the alloying process is very easy to produce bubbles, shrinkage holes and shrinkage, resulting in high porosity of the alloy, which cannot meet the requirements of target density.

1. Sputtering target Sputtering target refers to a sputtering source that is sputtered and deposited on a substrate to form various functional thin films by magnetron sputtering, multi-arc ion plating or other types of coating equipment under appropriate process conditions. Shooting targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, magnetic recording, flat display, solar cells, etc. The target materials required in different fields are different. According to the production method, the sputtering target materials can be divided into Powder target, smelting target and spraying target; according to the shape, it can be divided into flat target and tubular target. The flat target can be divided into rectangular target and arc target; according to the composition can be divided into pure metal target, alloy target, There are many varieties of oxide targets, silicide targets and so on.

2. The principle of sputtering coating is to bombard the solid surface with accelerated ions, and the ions and the solid surface atoms exchange momentum, so that the atoms on the solid surface leave the solid and deposit on the surface of the substrate. This process is the sputtering coating. Figure 1 shows the sputtering coating process. Schematic diagram. The film deposited by sputtering with a target has high density and good adhesion to the substrate. Therefore, sputtering deposition has become a widely used film preparation technology. Titanium aluminum alloy sputtering target preparation technology Sputtering alloy target The material needs to meet the requirements of purity, density, grain size, surface finish and other requirements. Among them, purity, density and grain size are directly related to the preparation process of the target. The preparation of metal alloys usually adopts the ordinary smelting method. However, the preparation of titanium and aluminum alloys This method is not suitable for the following reasons:
(1) The smelting process of titanium aluminum alloy is easy to form a variety of intermetallic compounds, such as Ti3A1, TiAl, TiAl2, TiAl3, etc. The existence of these intermetallic compounds leads to the processing brittleness of titanium aluminum alloy, especially when the aluminum content in the alloy exceeds 50% (Atomic ratio), the problem is particularly obvious;
(2) The smelting process is used to prepare titanium-aluminum alloy targets, and bubbles, porosity and segregation are prone to occur during the casting process, resulting in uneven composition and structure in the alloy, resulting in unstable target quality.
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