Ti70% Al30% Tial Target in non-corrosive valves

Product Details:
Place of Origin: China
Brand Name: Jinxing
Certification: ISO
Model Number: TiAl Targets
Payment & Shipping Terms:
Minimum Order Quantity: 10kgs
Price: 10-100USD/kg
Packaging Details: Standard exporting package
Delivery Time: 10days
Payment Terms: L/C, T/T
Supply Ability: 10ton month

Detail Information

Purity: Al-Ti (35/65at%), Al/Ti (50:50 At%) Shape: Discs, Plate, Step
Certification: ISO 9001:2008 Specification: Customized As Request
Process: HIP Name: TiAl Targets
High Light:

Al30% Tial Target

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Ti70% Tial Target

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Ti70al30 Tial Target

Product Description

Ti70al30 TiAl Targets

 

Titanium-aluminum alloy sputtering targets (TiAl Targets )can be manufactured in two ways: HIP and melting. The goal through HIP will be higher density. The target through melting will have a higher purity. Everything is based on your application.

Purity: Al-Ti35/65 at% Al/Ti 50: 50 at%, 99.95%, 99.5%

Shape: Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm)

Uses: Mainly used for tool coating, non-corrosive valves/chemical plants, shipbuilding industry.

 

TiAl Sputtering Target, High Quality, Monolithic, Rotatable, Cylindrical, Straight, Dogbone, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, TiAl Sputtering Targets Manufacturer and Supplier

 

TITANIUM ALUMINUM (TiAl) SPUTTERING TARGET

Titanium Aluminum Nitride (TiAlN) coating is recommended for applications where heat resistance and extreme hardness is required for abrasive materials. It is a high-performance coating which excels in abrasive and difficult-to-machine materials such as cast iron, aluminum alloys, tool steels, and nickel alloys.


Jinxing Titanium aluminum (TiAl) sputtering targets and cathodes can provide you an outstanding oxidation-resistant nitride coating (TiAlN) which will well protect your drills, milling machines, index-able cutting inserts and all kind of other cutting tools against wear and therefore extends their service life.

Jinxing Titanium Aluminum(TiAl) Sputtering Targets include titanium aluminum(TiAl) rotary sputtering targets, titanium aluminum(TiAl) planar sputtering targets and titanium aluminum(TiAl) cathodic targets.

Titanium Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

Manufacturing Range
OD (mm):80 - 160
ID (mm):60 - 125
Length (mm):100 - 4000
Custom Made

Specification
Composition: 25/75, 30/70, 33/67, 40/60, 50/50,60/40, 67/33, 70/30, 75/25, 80/20
Purity: 99.7%
Density:3.1 - 4.0 g/cm3
Grain Sizes:< 100 micron or on request
Fabrication Processes
HIP, Plasma Spraying, Machining, Bonding
Shape
Straight, Dog boneEnd Types
SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
Custom Made for SS Backing Tube
Surface:Ra 1.6 micron

Other Specification
Vapor degreased and demagnetized after final machining.
ID to be Jinxingand OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

TiAl Targets Picture:

Ti70% Al30% Tial Target in non-corrosive valves 0Ti70% Al30% Tial Target in non-corrosive valves 1

Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
Ti Al Fe Si Mg Cl C Mn O N
46.30 53.20 0.075 0.066 0.030 0.013 0.016 0.008 0.095 0.003

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