Chromium Tube Cr Sputtering Target Silver Gray Appearance With Ductility

Product Details:
Place of Origin: China
Brand Name: JINXING
Certification: ISO 9001
Model Number: Chromium Tube Sputtering Target
Payment & Shipping Terms:
Minimum Order Quantity: 1kg
Price: 20~100USD/kg
Packaging Details: Plywood case
Delivery Time: 10~25 work days
Payment Terms: L/C, D/A, D/P, T/T, Western Union
Supply Ability: 100000kgs/M

Detail Information

Material: Chromium, Chrome Process: CIP, HIP Pressing
Size: Customized Application: PVD Coating,
Density: 7.19g/cm3 Shape: Round , Plate , Tube Sputtering Target
Grain Size: Fine Grain Size, Good Density Purity: 99.5%, 99.9%, 99.95%
High Light:

titanium sputter target

,

tungsten sputtering target

Product Description

Chromium Tube Sputtering Target

Chromium tube sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal

 

  • Description

Chromium Tube Sputtering Target, Chromium Pipe Sputtering Target are available in varying sizes 

 

1. The purity of high purity chromium target is 99.5%, 99.8%, 99.95%, 99.99%

2. Common specifications of high-purity chromium target: high-purity chromium tube target, high-purity chromium ring target, length 20-400mm, diameter 50-120mm, tube thickness 5-10mm. TiO2, TiB2, Ti3O5, etc. can be plasma sprayed on the chromium tube target, customized according to your requirements.

3. Production process of high purity chromium target: hot isostatic pressing, powder metallurgy.

4. High purity chromium particles: common particle sizes are: 1-3mm, 3-5mm, 40 mesh, - 20-300 mesh, 40 × 60 × 80 × 200 × for evaporation coating, with high purity and good evaporation effect.

5. High purity chromium strip: Ø 0.3, Ø 0.5, Ø 1.0, etc.

6. Relevant parameters of high-purity chromium: Formula: Cr

7. Appearance: silver gray

8. Specification: grain, powder, target material, bar.

 

 

Grades: Chrome Sputtering target
  Purity: 99.5%, 99.9%, 99.95%
Chromium Alloy
AlCr, CrAl, CrSi, TiCr etc
Density:  7.19g/cm3
Shape: Round Shape , Tube Shape and Plate Shape.

 

Through hot (cold) isostatic pressing, metal smelting and powder metallurgy, our company specializes in producing various magnetron sputtering targets: chromium target, aluminum target, copper target, silver target, zinc aluminum target, copper indium gallium selenium target, copper indium target, copper indium gallium target, germanium antimony tellurium target, lanthanum strontium manganese oxide target, iron bismuth manganese oxide target, chromium target, nickel chromium target, zinc target, aluminum target, magnesium target, hafnium target, scandium target, silicon target, silicon target, tellurium target, niobium target, tantalum target, Cobalt chromium target, aluminum iridium target, Iron chromium aluminum iridium target, boron carbide target, boron nitride target, titanium nitride target, monocrystalline silicon target, polycrystalline silicon target, silicon dioxide target, titanium dioxide target, aluminum oxide target, strontium titanate target, barium titanate target, zirconia target, hafnium oxide target, copper oxide target, manganese oxide target, magnesium oxide target, zinc oxide target, zinc sulfide target, cadmium sulfide target, boron nitride target, silicon carbide target, yttrium oxide target, zinc oxide target, strontium titanate target, Silver indium antimony tellurium alloy target, Indium Telluride target, ruthenium target, palladium target, iridium target, gold target, platinum target, silver target, osmium target, azo target, ITO target, cadmium telluride target, cadmium sulfide target, zinc telluride target, indium selenide target, copper selenide target, lanthanum strontium manganese oxide and other metal targets, alloy target, ceramic target, monocrystalline silicon substrate, silicon oxide substrate, alumina substrate, etc. Mainly according to the specific requirements of customers, we process various specifications and target materials of various ingredients. Our products are of higher quality, lower price and short delivery time. We maintain good business contacts with many domestic coating factories, coating machine manufacturers, scientific research institutions and domestic and foreign universities. At present, our company is providing customers with common growth and development space with high-quality products, systematic services and scientific management.

 

Application:


1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.


2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.


3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.

 

Type Application Main alloy Request
Semiconductor Preparation of core materials for integrated circuits W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

 

 

 

Highest technical requirements, ultra-high purity metal, high precision size, high integration

 

Screen Display Sputtering technology ensures uniformity of film production, improves productivity and reduces cost Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

 

 

 

High technical requirements, high-purity materials, large material area and high degree of uniformity

 

Decorate It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

 

 

 

 

Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target

 

mainly used for decoration, energy saving, etc
Tooling

 

 

 

Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts

 

TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc High performance requirements and long service life
Solar photovoltaic Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc Wide Application
Electronic accessories

 

 

 

 

For film resistance and film capacitance

 

NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc Small size, good stability and small resistance temperature coefficient are required for electronic devices
Information storage

 

 

 

 

For making magnetic memory

 

Cr based, Co based, CO Fe based, Ni based alloys High storage density, high transmission speed

Chromium Tube Cr Sputtering Target Silver Gray Appearance With Ductility 0

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