High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic materials.

FANMETAL Produces high-purity pure metal and alloy sputtering targets with the highest density and smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We typically use vacuum melting or hot isostatic pressing (HIP) for production. We choose the appropriate production process to create a product that meets your specific application requirements.

Our sputtering targets are in a comprehensive range, purity levels, shapes and sizes. For example, the most common target shapes include circular, rectangular, annular and tubular. Depending on the size of the target and the nature of the material, they can be single-segmented or multi-segmented. We can customize according to your needs.

Titanium Aluminium Zirconium Chrome Sputtering Target Specification