PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape

Product Details:
Place of Origin: China
Brand Name: JINXING
Certification: ISO 9001
Model Number: Chromium Sputtering Target
Payment & Shipping Terms:
Minimum Order Quantity: 1kg
Price: 20~100USD/kg
Packaging Details: Plywood case
Delivery Time: 10~25 work days
Payment Terms: L/C, D/A, D/P, T/T, Western Union
Supply Ability: 100000kgs/M

Detail Information

Application: PVD Coating, Material: Chromium, Chrome
Process: CIP, HIP Pressing Size: Customized
Density: 7.19g/cm3 Shape: Round , Plate , Tube Sputtering Target
Grain Size: Fine Grain Size, Good Density Purity: 99.5%, 99.9%, 99.95%
High Light:

metal sputtering targets

,

titanium sputter target

Product Description

Chromium Sputtering Target

Chromium sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal

 

  • Hot Pressing
  • Hot Isostatic Pressing (HIP)
  • Cold Isostatic Pressing (CIP)
  • Vacuum Sintering
  • Induction Melting
  • Vacuum Melting & Casting
  • Arc Melting
  • Electron-Beam Melting
  • Plasma Spraying
  • Co-Precipitation
  • Description

Chromium Sputtering Target, Chromium Target are available in varying sizes 

 

The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.

 

Grades: Chrome Sputtering target
  Purity: 99.5%, 99.9%, 99.95%
Familar Size D100x40mm , D65x35mm
Density:  7.19g/cm3
Shape: Round Shape , Tube Shape and Plate Shape.

 

Sizes:

 

Plate sputtering targets:

 

Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.

 

Cylinder sputtering targets:

 

3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.

 

Tube sputtering targets:

 

2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.

 

Based on the thermodynamic analysis of the vacuum sintering process of pure chromium target for magnetron sputtering, the necessary conditions for the sintering process were established and applied to the sintering practice. The sputtering target with oxygen content less than 0.07% was successfully achieved. 

 

Type Application Main alloy Request
Semiconductor Preparation of core materials for integrated circuits W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

 

 

 

Highest technical requirements, ultra-high purity metal, high precision size, high integration

 

Screen Display Sputtering technology ensures uniformity of film production, improves productivity and reduces cost Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

 

 

 

High technical requirements, high-purity materials, large material area and high degree of uniformity

 

Decorate It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

 

 

 

 

Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target

 

mainly used for decoration, energy saving, etc
Tooling

 

 

 

Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts

 

TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc High performance requirements and long service life
Solar photovoltaic Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc Wide Application
Electronic accessories

 

 

 

 

For film resistance and film capacitance

 

NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc Small size, good stability and small resistance temperature coefficient are required for electronic devices
Information storage

 

 

 

 

For making magnetic memory

 

Cr based, Co based, CO Fe based, Ni based alloys High storage density, high transmission speed

PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape 0

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