Forged Zirconium Sputtering Target Zr702 Sputter Target
|Place of Origin:||China|
|Model Number:||Titanium Aluminum Alloy Targets|
Payment & Shipping Terms:
|Minimum Order Quantity:||10kgs|
|Packaging Details:||Standard exporting package|
|Payment Terms:||L/C, T/T|
|Supply Ability:||10ton month|
|Purity:||Al-Ti (35/65at%), Al/Ti (50:50 At%)||Shape:||Discs, Plate, Step|
|Certification:||ISO 9001:2008||Specification:||Customized As Request|
|Process:||HIP||Name:||Titanium Aluminum Alloy Targets|
Titanium Aluminum Sputtering Targets,
Electroplating Sputtering Targets,
Titanium Aluminum Alloy Sputtering Targets
Titanium Aluminum Alloy Targets
Titanium-aluminum alloy targets need to meet the requirements of purity, density, grain size, and surface finish. Among them, purity, density and grain size are directly related to the target preparation process.
The ordinary smelting method usually used in the preparation of metal alloys. However, this method is not suitable for the preparation of titanium aluminum alloy, and the main reasons are as follows:
(1) The smelting process of titanium aluminum alloy is easy to form a variety of intermetallic compounds, such as Ti3A1, TiAl, TiAl2, TiAl3, etc. The presence of these intermetallic compounds causes the processing brittleness of titanium aluminum alloy, especially when the aluminum content in the alloy exceeds 50% (Atomic ratio), this problem is particularly obvious;
(2) Titanium-aluminum alloy targets are prepared by smelting process. Bubbles, looseness and segregation are prone to occur during the casting process, resulting in uneven composition and structure in the alloy, resulting in unstable target quality.
According to research reports on the production process of titanium-aluminum alloy targets at home and abroad, the main preparation techniques of titanium-aluminum alloy sputtering targets at present include: high current heating method, hot isostatic pressing sintering method, and hot pressing sintering method.
Titanium Aluminum Alloy Targets Description
|Purity||Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%|
|Shape||Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm
|Specification||Customized as request|
|Process||Forged , Rolling , Grinding|
2. Chemical engineering & Petrochemical technology;
|Density/Orgin country||4.51g/cm3 /Henan province|
Titanium Aluminum Alloy Targets Picture:
Strong current heating method: Using a device that can obtain a large current, the high current is used to heat the titanium powder and aluminum powder, and pressure is applied to cause the aluminum and titanium to react with themselves to form a titanium aluminum alloy target.
Hot isostatic pressing sintering method: This method mixes titanium powder and aluminum powder, and then passes through powder loading, cold isostatic pressing, pre-compression, degassing, and then hot isostatic pressing molding, and finally sintering and processing. Titanium aluminum alloy target.
Hot pressing sintering method: This process makes titanium aluminum powder sintered under the combined action of heat and force, and uses the low melting point of aluminum in the Ti-Al mixture to bond the titanium powder together to form an alloy sputtering target.
Hot press sintering is the most potential preparation technology for titanium aluminum alloy sputtering targets. The technology has high process efficiency and is suitable for industrialized production. However, using this technology to prepare titanium aluminum alloy targets requires repeated trials to select a suitable release agent to improve.