Forged Zirconium Sputtering Target Zr702 Sputter Target
|Place of Origin:||China|
|Model Number:||Aluminum Sputtering Target|
Payment & Shipping Terms:
|Minimum Order Quantity:||1kg|
|Packaging Details:||Plywood case|
|Delivery Time:||10～25 work days|
|Payment Terms:||L/C, D/A, D/P, T/T, Western Union|
|Material:||Aluminum Sputtering Target||Process:||CIP, HIP Pressing|
|Size:||Customized||Application:||PVD Coating System|
|Shape:||Round , Plate, Tube||Grain Size:||Fine Grain Size, Good Density|
|Purity::||99.95%, 99.99%, 99.999%||Density:||2.7g/cm3|
metal sputtering targets,
tungsten sputtering target
High purity material, ultra-high purity material, semiconductor high purity material
Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...
Aluminum Sputtering Target 99.99% , Aluminum Sputtering Target 99.999% are available in varying sizes
D101.6x3.175mm , D101.6x6.35mm etc
Another important use of ultra-high purity aluminum is as wiring for integrated circuits. The trace impurities of uranium and thorium in ultra-high purity aluminum are as few as possible, because they are radioactive elements, which release α particles at all times, resulting in the failure of integrated circuits and program errors and confusion. U + Th < 5ppb (wt%) in 5n2 high purity aluminum and U + Th < 1ppb (wt%) in 5n5 ultra high purity aluminum. < 5ppb (wt%), in 5n5 ultra-high purity aluminum
5N and 5n5 large-scale plate targets are widely used in PDP and TFT-LCD flat panel displays and sputtering targets for solar cell coating.
In the field of superconductivity, ultra-high purity aluminum is used as the stabilizing material of superconducting cable.
In the field of electronics, 5N ultrapure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro disk, DVD silver disk, etc., in which 5N ultrapure aluminum sputtering film is used as the light reflecting layer.
The impurity content of ultra pure aluminum is very little.
The low impurity content makes the ultra pure aluminum have some special properties.
The lower the content of impurity elements, the smaller the density of intermetallic compounds.
Use as a good conductor of electricity
The resistance in the very low temperature region is very small
High reflectivity to UV
Design freedom spread
It is highly resistant to corrosive gases and solutions
|Product Name||Element||Purirty||Melting Point ℃||Density (g/cc)||Available Shapes|
|High Pure Sliver||Ag||4N-5N||961||10.49||Wire, Sheet, Particle, Target|
|High Pure Aluminum||Al||4N-6N||660||2.7||Wire, Sheet, Particle, Target|
|High Pure Gold||Au||4N-5N||1062||19.32||Wire, Sheet, Particle, Target|
|High Pure Bismuth||Bi||5N-6N||271.4||9.79||Particle, Target|
|High Pure Cadmium||Cd||5N-7N||321.1||8.65||Particle, Target|
|High Pure Cobalt||Co||4N||1495||8.9||Particle, Target|
|High Pure Chromium||Cr||3N-4N||1890||7.2||Particle, Target|
|High Pure Copper||Cu||3N-6N||1083||8.92||Wire, Sheet, Particle, Target|
|High Pure Ferro||Fe||3N-4N||1535||7.86||Particle, Target|
|High Pure Germanium||Ge||5N-6N||937||5.35||Particle, Target|
|High Pure Indium||In||5N-6N||157||7.3||Particle, Target|
|High Pure Magnesium||Mg||4N||651||1.74||Wire, Particle, Target|
|High Pure Magnesium||Mn||3N||1244||7.2||Wire, Particle, Target|
|High Pure Molybdenum||Mo||4N||2617||10.22||Wire, Sheet, Particle, Target|
|High Pure Niobium||Nb||4N||2468||8.55||Wire, Target|
|High Pure Nickel||Ni||3N-5N||1453||8.9||Wire, Sheet, Particle, Target|
|High Pure Lead||Pb||4N-6N||328||11.34||Particle, Target|
|High Pure Palladium||Pd||3N-4N||1555||12.02||Wire, Sheet, Particle, Target|
|High Pure Platinum||Pt||3N-4N||1774||21.5||Wire, Sheet, Particle, Target|
|High Pure Silicon||Si||5N-7N||1410||2.42||Particle, Target|
|High Pure Tin||Sn||5N-6N||232||7.75||Wire, Particle, Target|
|High Pure Tantalum||Ta||4N||2996||16.6||Wire, Sheet, Particle, Target|
|High Pure Tellurium||Te||4N-6N||425||6.25||Particle, Target|
|High Pure Titanium||Ti||4N-5N||1675||4.5||Wire, Particle, Target|
|High Pure Tungsten||W||3N5-4N||3410||19.3||Wire, Sheet, Particle, Target|
|High Pure Zinc||Zn||4N-6N||419||7.14||Wire, Sheet, Particle, Target|
|High Pure Zirconium||Zr||4N||1477||6.4||Wire, Sheet, Particle, Target|