TiAl Target ALTi2021 New Price With High Quality
|Place of Origin:||China|
|Model Number:||TiAl Targets|
Payment & Shipping Terms:
|Minimum Order Quantity:||10kgs|
|Packaging Details:||Standard exporting package|
|Payment Terms:||L/C, T/T|
|Supply Ability:||10ton month|
|Purity:||Al-Ti (35/65at%), Al/Ti (50:50 At%)||Shape:||Discs, Plate, Step|
|Certification:||ISO 9001:2008||Specification:||Customized As Request|
Al30% Tial Target,
Ti70% Tial Target,
Ti70al30 Tial Target
Ti70al30 TiAl Targets
Titanium-aluminum alloy sputtering targets (TiAl Targets )can be manufactured in two ways: HIP and melting. The goal through HIP will be higher density. The target through melting will have a higher purity. Everything is based on your application.
Purity: Al-Ti35/65 at% Al/Ti 50: 50 at%, 99.95%, 99.5%
Shape: Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm)
Uses: Mainly used for tool coating, non-corrosive valves/chemical plants, shipbuilding industry.
TiAl Sputtering Target, High Quality, Monolithic, Rotatable, Cylindrical, Straight, Dogbone, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, TiAl Sputtering Targets Manufacturer and Supplier
TITANIUM ALUMINUM (TiAl) SPUTTERING TARGET
Titanium Aluminum Nitride (TiAlN) coating is recommended for applications where heat resistance and extreme hardness is required for abrasive materials. It is a high-performance coating which excels in abrasive and difficult-to-machine materials such as cast iron, aluminum alloys, tool steels, and nickel alloys.
Jinxing Titanium aluminum (TiAl) sputtering targets and cathodes can provide you an outstanding oxidation-resistant nitride coating (TiAlN) which will well protect your drills, milling machines, index-able cutting inserts and all kind of other cutting tools against wear and therefore extends their service life.
Jinxing Titanium Aluminum(TiAl) Sputtering Targets include titanium aluminum(TiAl) rotary sputtering targets, titanium aluminum(TiAl) planar sputtering targets and titanium aluminum(TiAl) cathodic targets.
Titanium Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target
OD (mm):80 - 160
ID (mm):60 - 125
Length (mm):100 - 4000
Composition: 25/75, 30/70, 33/67, 40/60, 50/50,60/40, 67/33, 70/30, 75/25, 80/20
Density:3.1 - 4.0 g/cm3
Grain Sizes:< 100 micron or on request
HIP, Plasma Spraying, Machining, Bonding
Straight, Dog boneEnd Types
SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
Custom Made for SS Backing Tube
Surface:Ra 1.6 micron
Vapor degreased and demagnetized after final machining.
ID to be Jinxingand OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.
TiAl Targets Picture:
|Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%|