Forged Zirconium Sputtering Target Zr702 Sputter Target
|Place of Origin:||China|
|Model Number:||Ti-Al Target|
Payment & Shipping Terms:
|Minimum Order Quantity:||10kgs|
|Packaging Details:||Standard packing|
|Payment Terms:||L/C, T/T|
Ti-Al Sputtering Targets,
Ti70Al30 Sputtering Targets,
Ti75Al25 Sputtering Targets
Titanium Aluminum target, Ti-Al target Ti70Al30, Ti75Al25
Ti-Al target Widely used in Decorating films. Gold, silver, balck and coloful series Decorating films
And used in some functional films. Wear resistance film, anti-friction film, corrosin resistance film, self-lubricating film.
competitive and high quality
competitive and good price
Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
Aluminum Titanium (AlTi) Sputtering Target Description
Aluminum Titanium (AlTi) alloy Sputtering Targets are produced by HIP technology, widely used for tool coating and decorative coating.Compared to melting technology, TiAl targets that produced by HIP technology have more uniform micro-inner structure, smaller grain size, and suitable for various magnetron sputtering machines and ION plating machines. End user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
The tools coated by AlTi thin films have higher feed speeds, better cutting performance, longer service life and higher metal removal rates can be achieved without difficulty.
Ti-Al target and arc cathodes are also used for decorative coating, to obtain golden brown and brownish black color films.
End user can obtain good hardness, high brightness, corrosion and oxidation resistant color without discolor for a very long time. Our targets have already been qualified by many end users, including manufacturers of watch, sanitary ware, car mirrors, and etc.
JX produce AlTi 25/75, AlTi 30/70, AlTi 33/67, AlTi 40/60, AlTi 50/50, AlTi 75/25 at% targets and cathodes for decorative and tool coating. The flexibility of our production process allow the microstructure of our coating materials be adjusted to achieve your desired effect. If grains of sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers.
The following pictures are two micrographs of our Aluminum Titanium (30/70 at%)sputtering target, the average grain size＜100μm.
Ti-Al target Picture:
|Name||Titanium Aluminum Alloy Sputtering Targets TIAL target|
|Shape||Square /round, according to your request|
Round: dia 25~250mm
Rectangular: length up to 1500mm
Customization is available
|Proportion(wt%)||5-80 ± 0.2Ti at your request.|
|Certificates||ISO9001:2008, the third test report|
widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field.
High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength