Ti50Al50 TiAl Titanium Aluminum Alloy With High Purity 99%,High Purity Titanium Aluminum Sputtering Targets TiAl7030 To Korea

Ti50Al50 TiAl Titanium Aluminum Alloy With High Purity 99%,High Purity Titanium Aluminum Sputtering Targets TiAl7030 To Korea

The sputtering target refers to the raw material used in the sputtering deposition process, which refers to the process of ejecting atoms from the solid target due to the bombardment of the target by high-energy particles, and its main function is to deposit a thin film on the workpiece . In the first ten days of June, we delivered the high-quality High Purity Titanium Aluminum Sputtering Targets TiAl7030 produced by us to the Korean customers safely and quickly by international express. Korean customers have always been satisfied with the metal products we provide and are willing to communicate with us on a technical level. The price and size specifications of the products also meet their requirements.

Ti50Al50 TiAl Titanium Aluminum Alloy With High Purity 99% is a very commonly used target, which can be produced by casting method and hot isostatic pressing method. It has high quality, high purity, uniform structure, long service life and good corrosion resistance. , High thermal conductivity and competitive price and so on. Titanium Aluminum Sputtering Targets are most commonly used in decorative coatings. They can deposit films with good hardness, high brightness, corrosion resistance, oxidation resistance, and fading resistance. They are widely used in hardware tool coatings, decorative coatings, and flat display coatings. layer, PVD and CVD processing, semiconductor components, and various magnetron sputtering machines and ion plating machines. Our company can also provide Copper Plate Sputtering Target, Zr702 Zr704 Zirconium Niobium Sputtering Targets and Aluminum Silicon Alsi Sputtering Targets and other metal sputtering target products. If necessary, welcome to contact us by email.