Titanium Aluminum Alloy Sputtering Targets In Electroplating,High Purity Titanium Aluminum Sputtering Targets To Singapore

Titanium Aluminum Alloy Sputtering Targets In Electroplating,High Purity Titanium Aluminum Sputtering Targets To Singapore

The sputtering target refers to the raw material used in the sputtering deposition process, and its main function is to deposit a thin film on the object to improve the wear resistance and service life of the workpiece. At the end of April, we safely delivered the completed High Purity Titanium Aluminum Sputtering Targets to our customers in Singapore via international express. This is the first time for the customer to order our sputtering targets, and he is very satisfied with the quality and price of our products, and had a friendly exchange on the product size, shape and processing technology. If any problem occurs during use, we will provide you with good after-sales service.

Titanium Aluminum Alloy Sputtering Targets In Electroplating provided by our company has the advantages of high quality, high purity, uniform structure, long service life, good corrosion resistance, high thermal conductivity and competitive price, and can deposit good hardness and high brightness , Anti-corrosion, anti-oxidation, and anti-fading film. High Purity Titanium Aluminum Sputtering Targets are very suitable for various metallurgical tool coatings, flat panel display coatings (such as watches, mobile phones and computers) and decorative coatings, PVD and CVD processing, semiconductor components, and are also commonly used in the field of ion sputtering and it.