Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
|Place of Origin:||China|
|Model Number:||Chromium Pieces|
Payment & Shipping Terms:
|Minimum Order Quantity:||1kg|
|Packaging Details:||Plywood case|
|Delivery Time:||10～25 work days|
|Payment Terms:||L/C, D/A, D/P, T/T, Western Union|
|Material:||Chromium, Chrome||Process:||CIP, HIP Pressing|
|Application:||Evaporation Material,Evaporation Coating||Density:||7.19g/cm3|
|Shape:||Sheet , Pieces, Cylinder , Granular, Powder||Grain Size:||Fine Grain Size, Good Density|
|Size:||Customized||Purity:||99.5%, 99.9%, 99.95%|
Chromium Sheets Sputtering Targets,
7.19 g/Cm3 Density Sputtering Targets,
Evaporation coating Sputtering Targets
Principle of evaporation coating:
the physical process of evaporation coating from material evaporation transportation to deposition is as follows:
1. Convert all kinds of energy into heat energy, heat the plating material to evaporate or sublime, and become gas particles (atoms, molecules or atomic groups) with certain energy (0.1-0.3ev);
2. Leaving the surface of the plating material, the gaseous particles with considerable velocity are transported to the surface of the substrate in a basically collision free linear flight;
3. The solid phase films are formed by the condensation of gaseous particles on the surface of the substrate;
4. The atoms that make up the film are rearranged or chemically bonded.
There are many kinds of evaporation coating materials. At present, there are hundreds of them are mainly used in the market. The production process mainly includes: Crystal crushing, melting crushing, wire drawing, wire cutting, granulation, pulverizing, tablet pressing, casting, molding, etc. The product shape mainly includes: wire rod, powder, irregular particle, small cylinder, small ball, cone
Chromium Pieces, Chromium sheets are available in varying sizes
Thickness influencing factors
1. Lattice matching degree of substrate and target
2. Substrate surface temperature
3. Evaporation power, rate
4. vacuum degree
5. Coating time and thickness.
The uniformity of the components of the evaporation coating is not easy to guarantee. The specific adjustable factors are the same as above. However, due to the limitation of the principle, the uniformity of the components of the evaporation coating is not good for the non single component coating.
1. Lattice matching degree
2. Substrate temperature
3. Evaporation rate
|Grades:||Chrome Sputtering target|
|Purity: 99.5%, 99.9%, 99.95%|
The main products are :
as follows: (particles, blocks and powders can be customized) aluminum particles 99.99% 3 * 3mm; 99.999% 3 * 3mm copper particles 99.99% 3 * 3mm; 99.999% 3 * 3mm iron particles 99.9% 2 * 3mm titanium particles 99.999% 6 * 6mm vanadium particles 99.9% 3 * 3mm nickel particles 99.999% 6 * 6mm chromium particles 99.95% 3-5mm cobalt particles 99.95% 2-8mm manganese particles 99.8% 1-10 mm barium particles 99.6% 2-6cm (as deoxidizer) Calcium particles 99.5% 1-3mm (used as deoxidizer) tungsten particles 99.95% 6 * 6mm niobium particles 99.95% 6 * 6mm molybdenum particles 99.95% 6 * 6mm tantalum particles 99.95% 6 * 6mm zirconium particles 99.5% 1.6 * 5mm; 99.95% 2.4 * 5mm crystal hafnium rods 99.9% d21mm hafnium particles 99.9%.
High purity aluminum Al, high purity copper Cu, high purity titanium Ti, high purity silicon Si, high purity gold Au, high purity silver AG, high purity indium in, high purity magnesium mg, high purity zinc Zn, high purity platinum Pt, high purity germanium Ge, high purity nickel Ni, High purity tantalum TA, gold germanium alloy Auge, gold nickel alloy auni, nickel chromium alloy NiCr, titanium aluminum alloy TiAl, copper indium gallium alloy cuinga, copper indium gallium selenium alloy CuInGaSe, zinc aluminum alloy ZnAl, aluminum silicon alloy AlSi and other metal coating materials.
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