10.2 g/cm3 Molybdenum Ion Implantation Parts Semiconductor Industry

Product Details:
Place of Origin: CHINA
Brand Name: JINXING
Certification: ISO 9001
Model Number: Molybdenum Ion Implantation Parts
Payment & Shipping Terms:
Minimum Order Quantity: 15 kg
Price: Negotiable
Packaging Details: plywood cases
Delivery Time: 15-20 days
Payment Terms: L/C, T/T, D/P, Western Union
Supply Ability: 2000 kg per month

Detail Information

Product Name: Molybdenum Ion Implantation Parts Grade: Mo1
Density: 10.2 G/cm3 Purity: >=99.95%
Tensile Strength: >320 MPa Elongation: <21%
Standard: ASTM B387-2010 Application: Semiconductor Industry
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Molybdenum Ion Implantation Semiconductor


10.2 G/Cm3 Ion Implantation Semiconductor


Ion Implantation Semiconductor Industry

Product Description

Molybdenum Ion Implantation Parts In Semiconductor Industry

Molybdenum Ion Implantation Parts means that when an ion beam is emitted into a solid material in vacuum, the ion beam knocks the atoms or molecules of the solid material out of the surface of the solid material. This phenomenon is called sputtering;


When the ion beam hits the solid material, it bounces back from the surface of the solid material or passes through the solid material. These phenomena are called scattering;


Another phenomenon is that after the ion beam is shot into the solid material, it is slowly reduced by the resistance of the solid material, and finally stays in the solid material. This phenomenon is called ion implantation.




Material Type Chemical Composition (by wt.)
Pure Moly Mo1 >99.95%min. Mo
Ti-Zr-Mo Alloy TZM 0,5 % Ti / 0,08 % Zr / 0,01 - 0,04 % C
Mo-Hf-C MHC 1,2 % Hf / 0,05 - 0,12 % C
Moly Rhenium MoRe 5,0 % Re
Moly Tungsten MoW20 20,0 % W
Moly Tungsten MoW505 0,0 % W







Advantages of Molybdenum Ion Implantation Parts Technology:

Ion implantation technology is an ion beam technology that ionizes the atoms of an element into ions, accelerates them at a voltage of tens to hundreds of kV, and injects them into the surface of workpiece material placed in vacuum target chamber after obtaining high speed.


After ion implantation, the physical, chemical and mechanical properties of the surface of the material will change significantly. The continuous wear resistance of the metal surface can reach 2 ~ 3 orders of magnitude of the initial implantation depth.

Molybdenum Ion Implantation Parts Picture:


10.2 g/cm3 Molybdenum Ion Implantation Parts Semiconductor Industry 010.2 g/cm3 Molybdenum Ion Implantation Parts Semiconductor Industry 1

APPLICATIONS of Molybdenum Ion Implantation Parts

The application of molybdenum ion implantation in the modification of metal materials is to inject a certain dose and energy of ions into the metal material surface after heat treatment or surface coating process, so as to change the chemical composition, physical structure and phase state of the material surface, so as to change the mechanical, chemical and physical properties of the material.


Specifically, ion implantation can change the acoustic, optical and superconducting properties of materials, improve the working hardness, wear resistance, corrosion resistance and oxidation resistance of materials, and finally prolong the working life of materials.

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