Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

Product Details:
Place of Origin: China
Brand Name: JINXING
Certification: ISO 9001
Model Number: Chromium Plate Sputtering Target
Payment & Shipping Terms:
Minimum Order Quantity: 1kg
Price: 20~100USD/kg
Packaging Details: Plywood case
Delivery Time: 10~25 work days
Payment Terms: L/C, D/A, D/P, T/T, Western Union
Supply Ability: 100000kgs/M

Detail Information

Material: Chromium, Chrome Process: CIP, HIP Pressing
Size: Customized Application: PVD Coating,
Density: 7.19g/cm3 Shape: Round , Plate , Tube Sputtering Target
Grain Size: Fine Grain Size, Good Density Purity: 99.5%, 99.9%, 99.95%
High Light:

Pure Chromium Plate Sputtering Targets


High Corrosion Resistance Sputtering Target


7.19 g/cm3 Sputtering Target

Product Description

Chromium Plate Sputtering Target

Chromium plate sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal


  • Description

Chromium Sputtering Target, Chromium Target are available in varying sizes 


The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.



Grades: Chrome Sputtering target
  Purity: 99.5%, 99.9%, 99.95%
Chromium Alloy AlCr, CrAl, CrSi, TiCr etc
Density:  7.19g/cm3
Shape: Round Shape , Tube Shape and Plate Shape.




Plate sputtering targets:


Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.


Cylinder sputtering targets:


3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.


Tube sputtering targets:


2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.


The effect of different processing methods on the sintering density of chromium target. In the process of mechanical pressing, two-way pressing is adopted without any molding agent and deoxidizer. The target density of Cr ring is 78% - 80% by mechanical pressing + vacuum sintering; the target density of Cr plate sputtering target is more than 82% by cold isostatic pressing + vacuum sintering; after rolling, the target density of Cr plate is increased to 90% - 95%; the sputtering target density of Cr alloy is more than 98% by hot pressing. By optimizing the sintering time and temperature, the sintering cost of chromium ring target is greatly reduced.



1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.

2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.

3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.


Type Application Main alloy Request
Semiconductor Preparation of core materials for integrated circuits W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N




Highest technical requirements, ultra-high purity metal, high precision size, high integration


Screen Display Sputtering technology ensures uniformity of film production, improves productivity and reduces cost Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target




High technical requirements, high-purity materials, large material area and high degree of uniformity


Decorate It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance





Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target


mainly used for decoration, energy saving, etc




Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts


TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc High performance requirements and long service life
Solar photovoltaic Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc Wide Application
Electronic accessories





For film resistance and film capacitance


NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc Small size, good stability and small resistance temperature coefficient are required for electronic devices
Information storage





For making magnetic memory


Cr based, Co based, CO Fe based, Ni based alloys High storage density, high transmission speed

Pure Chromium Plate Sputtering Targets With High Corrosion Resistance 0

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