Name: PVD Thin Film Coating Molybdenum Sputtering Targets
Brand: JINXING MATECH CO LTD
SKU: Molybdenum Sputtering Target
Availability: InStock

PVD Thin Film Coating Molybdenum Sputtering Targets

Product Details:

Place of Origin:

China

Brand Name:

JINXING

Certification:

ISO 9001

Model Number:

Molybdenum Sputtering Target

Payment & Shipping Terms:

Minimum Order Quantity:

1kg

Packaging Details:

Plywood case

Delivery Time:

10～25 work days

Payment Terms:

L/C, D/A, D/P, T/T, Western Union

Supply Ability:

100000kgs/M

Detail Information
Material:	Molybdenum Sputtering Target	Color/Appearance:	Grey, Metallic
Size:	Customized	Application:	PVD Coating System
Shape:	Round, Target,disc	Grain Size:	Fine Grain Size, Good Density
Purity::	99.95%	Density:	10.2g/cm3
Highlight:	Molybdenum Sputtering Targets , PVD Coating Sputtering Targets , 99.95% Purity Sputtering Targets

Product Description

Molybdenum Sputtering Target for Thin Film Coating

Product Description:

1. Grade: Mo1,TZM,MoNb alloy.

2. Purity :> =99.95%

3. Characteristic:

Melting Point: 2610°C

Boiling Point:5560°C

Density: 10.2g/cm3

High quality, workability

4. Certificate: ISO9002

5. Product Feature: High melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion.

The melting point of coated molybdenum sputtering target is 2610℃ and boiling point is 5560 ℃. And the purity of it can up to 99.95%.

Coated molybdenum sputtering target has a lot of advantages such as high melting point, high physical strength, high elasticity modulus, great thermal conductivity and corrosion resistance and so on.

Application:

· Electronical industry as PCB coating;

· Flat Panel Display industry as LCD coating;

· Optical coating

· Electronic semiconductor

· Sputtering material & vacuum coating;

· PVD film coating etc.

Product Name	Element	Purirty	Melting Point ℃	Density (g/cc)	Available Shapes
High Pure Sliver	Ag	4N-5N	961	10.49	Wire, Sheet, Particle, Target
High Pure Aluminum	Al	4N-6N	660	2.7	Wire, Sheet, Particle, Target
High Pure Gold	Au	4N-5N	1062	19.32	Wire, Sheet, Particle, Target
High Pure Bismuth	Bi	5N-6N	271.4	9.79	Particle, Target
High Pure Cadmium	Cd	5N-7N	321.1	8.65	Particle, Target
High Pure Cobalt	Co	4N	1495	8.9	Particle, Target
High Pure Chromium	Cr	3N-4N	1890	7.2	Particle, Target
High Pure Copper	Cu	3N-6N	1083	8.92	Wire, Sheet, Particle, Target
High Pure Ferro	Fe	3N-4N	1535	7.86	Particle, Target
High Pure Germanium	Ge	5N-6N	937	5.35	Particle, Target
High Pure Indium	In	5N-6N	157	7.3	Particle, Target
High Pure Magnesium	Mg	4N	651	1.74	Wire, Particle, Target
High Pure Magnesium	Mn	3N	1244	7.2	Wire, Particle, Target
High Pure Molybdenum	Mo	4N	2617	10.22	Wire, Sheet, Particle, Target
High Pure Niobium	Nb	4N	2468	8.55	Wire, Target
High Pure Nickel	Ni	3N-5N	1453	8.9	Wire, Sheet, Particle, Target
High Pure Lead	Pb	4N-6N	328	11.34	Particle, Target
High Pure Palladium	Pd	3N-4N	1555	12.02	Wire, Sheet, Particle, Target
High Pure Platinum	Pt	3N-4N	1774	21.5	Wire, Sheet, Particle, Target
High Pure Silicon	Si	5N-7N	1410	2.42	Particle, Target
High Pure Tin	Sn	5N-6N	232	7.75	Wire, Particle, Target
High Pure Tantalum	Ta	4N	2996	16.6	Wire, Sheet, Particle, Target
High Pure Tellurium	Te	4N-6N	425	6.25	Particle, Target
High Pure Titanium	Ti	4N-5N	1675	4.5	Wire, Particle, Target
High Pure Tungsten	W	3N5-4N	3410	19.3	Wire, Sheet, Particle, Target
High Pure Zinc	Zn	4N-6N	419	7.14	Wire, Sheet, Particle, Target
High Pure Zirconium	Zr	4N	1477	6.4	Wire, Sheet, Particle, Target

Molybdenum Sputtering Target Picture:

PVD Thin Film Coating Molybdenum Sputtering Targets 0

Tag:

PVD Thin Film Coating Molybdenum Sputtering Targets

Molybdenum Sputtering Targets

PVD Coating Sputtering Targets

99.95% Purity Sputtering Targets

Product Description:

tungsten sputtering target

metal sputtering targets

titanium sputter target

JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel metal etc,