Detail Information
Material:	Titanium Cylindrical Sputtering Targets	Process:	CIP, HIP Pressing
Size:	Customized	Application:	PVD Coating System
Shape:	Round , Plate, Tube	Grain Size:	Fine Grain Size, Good Density
Purity::	99.5%， 99。95%	Density:	4.52g/cm3

Composition	Ti
Purity	CP Grade 2 (99.5%), CP Grade 1 (99.7%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)
Density	4.51 g/cm3
Grain Sizes	< 50 micron or on request
Fabrication Processes	Vacuum Melting, Forging, Extruding, Machining
Shape	Straight, Dog Bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Surface	Ra 1.6 Micron or on request

Magnetron sputtering target,/rotating target (tube target)
Item	purity	Density	shape	Dimension(mm)
TiAl target	2N8-4N	3.6-4.2	Tube,disc,plate	OD70 x T 7 x L Other as customized
Cr target	2N7-4N	7.19	Tube,disc,plate	OD80 X T8 X L Other as customized
Ti target	2N8-4N	4.51	Tube,disc,plate	OD127 x ID105 x L OD219 x ID194 x L OD300 x ID155 x L Other as customized
Zr Target	2N5-4N	6.5	Tube,disc,plate	Other as customized
Al target	4N-5N	2.8	Tube,disc,plate
Ni target	3N-4N	8.9	Tube,disc,plate
Cu target (copper )	3N-4N5	8.92	Tube,disc,plate
Cu target (brass)	3N-4N5	8.92	Tube,disc,plate
Ta target	3N5-4N	16.68	Tube,disc,plate	OD146xID136x299.67(3pcs)

Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

tungsten sputtering target