99.8% Ti70Al30 Sputtering Targets Vacuum Melting Technics

Product Details:
Place of Origin: China
Brand Name: Jinxing
Certification: ISO
Model Number: TiAl Ti70Al30 Sputtering Targets
Payment & Shipping Terms:
Minimum Order Quantity: 10kgs
Price: 10-100USD/kg
Packaging Details: Standard exporting package
Delivery Time: 10days
Payment Terms: L/C, T/T
Supply Ability: 10ton month

Detail Information

Purity: Al-Ti (35/65at%), Al/Ti (50:50 At%) Shape: Discs, Plate, Step
Certification: ISO 9001:2008 Specification: Customized As Request
Process: HIP Name: Ti70Al30 Sputtering Targets
High Light:

Ti70Al30 Sputtering Targets


99.8% tial Sputtering Targets


Vacuum Melting Sputtering Targets

Product Description

Ti70Al30 Sputtering Targets
JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc.
Ti, Cr, Zr, TiAl, Ni, Cu, Stainless Steel, etc.
Cr and TiAl targets from JX are produced by hot isostatic pressing (HIP) process which can provide the character of high purity, high density, homogenous composition and fine grain. Both planar and rotary targets can be provided on request.
Ti Al Sputtering Targets 
Properies of TiAl Target
Purity >99.8% (2N8)
Relative Density >99.6%
Grain Size <100μm
Dimension Max Length: 1800mm; Max Width: 350mm Max Dia: 500mm
Typical Products Ti-33Al, Ti-40Al, Ti-50Al, Ti-67Al, Ti-70Al, Ti-75Al (at%)
Other special specifications are available on customers' request.
Name Titanium Aluminum Alloy Sputtering Targets TIAL target
Shape Square /round, according to your request
Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Proportion(wt%) 5-80 ± 0.2Ti at your request.
Impurity content low
Certificates ISO9001:2008, the third test report
Technics Vacuum melting

widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.

c:decoration and mould field.


High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength


Ti Al Sputtering Targets Picture:

99.8% Ti70Al30 Sputtering Targets Vacuum Melting Technics 099.8% Ti70Al30 Sputtering Targets Vacuum Melting Technics 1

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