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High Purity Titanium Aluminum Sputtering Targets TiAl7030
High Purity Titanium Aluminum Sputtering Targets TiAl7030
High Purity Titanium Aluminum Sputtering Targets TiAl7030 High Purity Titanium Aluminum Sputtering Targets TiAl7030 High Purity Titanium Aluminum Sputtering Targets TiAl7030 High Purity Titanium Aluminum Sputtering Targets TiAl7030 High Purity Titanium Aluminum Sputtering Targets TiAl7030

High Purity Titanium Aluminum Sputtering Targets TiAl7030

Product Details:
Place of Origin: China
Brand Name: JX
Certification: ISO
Model Number: High Purity Titanium Aluminum Sputtering Target TiAl7030
Payment & Shipping Terms:
Minimum Order Quantity: 10kgs
Price: USD50-100
Packaging Details: Standard packing
Delivery Time: 15days
Payment Terms: L/C, T/T
Supply Ability: 2ton、
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Detail Information
Purity: High Purity Titanium Aluminum Sputtering Target TiAl7030 Shape: Rod
Process: HIP Size: 20-250
Technics: Vacuum Melting
High Light:

Titanium Aluminum Sputtering Targets

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High Purity Sputtering Targets

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TiAl7030 Sputtering Targets

Product Description

high purity Titanium Aluminum Sputtering Target TiAl7030
To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote.

Titanium Aluminum Sputtering Target Features

Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting.
The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.

Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
Shape: Discs, Plate, Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 1000mm, Width 300mm, Thickness 1mm) Tube(Diameter< 300mm, Thickness >2mm )
Application: Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industry.

 

Titanium Aluminum Sputtering Target  Description

Purity Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%
Shape Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm
Certification ISO 9001:2008
Specification Customized as request
Process Forged , Rolling , Grinding
Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical
Density/Orgin country 4.51g/cm3 /Henan province

 Titanium Aluminum Sputtering Target TiAl7030 Picture:

High Purity Titanium Aluminum Sputtering Targets TiAl7030 0High Purity Titanium Aluminum Sputtering Targets TiAl7030 1

High pure metal sputtering target
Aluminum Al pellet,round,planar,rotatable target 3N~6N
Chronium Cr 2N~3N5
Platinum Pt 4N~5N
Nickel Ni 4N~5N
Cobalt Co 3N~4N
Zirconium Zr 2N2~4N
Titanium Ti 4N~5N
Copper Cu 4N~5N
Molybdenum Mo 3N~4N
Niobium Nb 3N5
Tatalum Ta 4N5
Tungsten W 3N5
Hafnium Hf 3N
Vanadium V 2N5~3N

 

Hot Tags: tial round tial titanium-alunium target used in functional films, China, manufacturers, suppliers, factory, company, wholesale, products

 

 

 

Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
Ti Al Fe Si Mg Cl C Mn O N
46.30 53.20 0.075 0.066 0.030 0.013 0.016 0.008 0.095 0.003

 

Tag:

tungsten sputtering target

metal sputtering targets

titanium sputter target

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