Tungsten Rhenium (W-Re) Alloy Sputtering Target

Product Description

Tungsten Rhenium (W-Re) Alloy Sputtering Targets Features & Application

Tungsten is a common target material. Adding rhenium to tungsten to form a tungsten-rhenium alloy can improve the plasticity and processing properties of tungsten. Tungsten-rhenium alloy has a series of excellent properties, such as high melting point, high hardness, high strength, high plasticity, high conductivity, corrosion resistance, wear resistance, high recrystallization temperature, low vapor pressure, low electron work function and low plastic-brittle transition temperature.
Tungsten Rhenium (W-Re) Alloy Sputtering Targets are often used as anode materials for various medical X-ray tubes. They use their high melting point and thermal stability to collide with electrons at high voltage to generate X-rays. These X-rays are used to penetrate the human body or materials to form images for medical diagnosis or detection of the internal structure of objects, and improve the efficiency and clarity of imaging technology. Tungsten Rhenium (W-Re) Alloy Sputtering Targets can also be widely used in the manufacture of integrated circuits and microelectronic devices. They can be used to deposit conductive layers or barrier layers to ensure the stability of electronic equipment operation.

Tungsten Rhenium (W-Re) Alloy Sputtering Targets Specifications:

Tungsten Rhenium (W-Re) Alloy Sputtering Targets Pictures